Inzwa yoxinzelelo oluphezulu lwe-YN52S00027P1 ifanelekile kwi-SK200-6 excavator yaseShengang

◆ Kwizinto ezisetyenziswa kwii-valve ze-ultra-high, unyango lobushushu kunye nokuqina komphezulu ngokuqhelekileyo kusetyenziselwa ukuphucula ukunyanzeliswa kwe-extrusion kunye nokumelana nokuguguleka.

1, unyango ubushushu vacuum

I-vacuum unyango lobushushu lubhekiselele kwinkqubo yonyango lobushushu apho i-workpiece ibekwe kwi-vacuum. Ukunyanga ubushushu be-vacuum akuvelisi i-oxidation, i-decarburization kunye nezinye i-corrosion ngexesha lokufudumeza, kodwa inomsebenzi wokucoca umphezulu, ukucima kunye nokunciphisa. I-Hydrogen, i-nitrogen kunye ne-oksijini efunnwe yimathiriyeli ngexesha lokunyibilikisa inokususwa kwi-vacuum, kwaye umgangatho kunye nokusebenza kwezinto eziphathekayo kunokuphuculwa. Ngokomzekelo, emva kokunyangwa kobushushu be-vacuum ye-valve ye-ultra-high yoxinzelelo lwenaliti eyenziwe nge-W18Cr4V, impembelelo yokuzithandela ye-valve yenaliti yonyuka ngokufanelekileyo, kwaye kwangaxeshanye, iipropati zomatshini kunye nobomi benkonzo buphuculwe.

2. Unyango lokomeleza ubuso

Ukuze kuphuculwe ukusebenza kweengxenye, ngaphezu kokutshintsha izinto eziphathekayo, iindlela zonyango zokomelezwa ngaphezulu ziyamkelwa. Okufana nokucinywa komphezulu (ukufudumeza kwedangatye, ukucima ubushushu obuphezulu kunye nobude obuphakathi, ukucinywa kombane wokufudumeza umphezulu, ukucima umphezulu we-electrolyte, ukucima umphezulu we-electron beam, njl.), i-carburizing, i-nitriding, i-cyaniding, i-boronizing (indlela ye-TD), ukomeleza i-laser, i-chemical vapor deposition (indlela ye-CVD), i-deposition yomoya womzimba (indlela ye-PVD), i-plasma chemical vapor deposition (indlela ye-PCVD) ukutshiza i-plasma, njl.

Ukubekwa komphunga ngokwasemzimbeni (indlela yePVD)

Kwi-vacuum, iindlela zenyama ezinje nge-evaporation, i-ion plating kunye ne-sputtering zisetyenziselwa ukuvelisa i-ion zetsimbi. Ezi ion zetsimbi zifakwe kumphezulu we-workpiece ukuze zenze i-coating yesinyithi, okanye ziphendule kunye ne-reactor ukuze zenze i-compound coating. Le nkqubo yonyango ibizwa ngokuba yi- physical vapour deposition, okanye iPVD ngokufutshane. Le ndlela ineengenelo zobushushu obuphantsi be-deposition, i-400 ~ 600℃ iqondo lokushisa lonyango, i-deformation encinci kunye nefuthe elincinci kwisakhiwo se-matrix kunye neepropati zamalungu. I-TiN layer yafakwa kwivalve yenaliti eyenziwe nge-W18Cr4V ngendlela ye-PVD. Umaleko we-TiN unobulukhuni obuphezulu kakhulu (2500～3000HV) kunye nokumelana nokunxiba okuphezulu, okuphucula ukuxhathisa kwevalve, ayigqwaliswanga kwi-dilute hydrochloric acid, sulfuric acid kunye ne-nitric acid, kwaye inokugcina indawo eqaqambileyo. Emva konyango lwe-PVD, ukugquma kunokuchaneka okulungileyo. Ingagutywa kwaye ipoliswe, kwaye uburhabaxa bayo bomphezulu yiRa0.8µm, enokufikelela kwi-0.01µm emva kokupholisha.